Experimental Investigation of Semiconductor Barriers Exposed to Variable Strong Electric Field at Vacuum Conditions

dc.contributor.authorSolmaz, Ramazan
dc.date.accessioned2025-10-18T13:23:10Z
dc.date.created2023
dc.date.issued2023
dc.departmentBartın Üniversitesi
dc.description.abstractThis study investigates alternating current barrier discharges in Townsend, glow, and arc modes when the barrier constitutes a semiconductor. First, the electrical characteristics of the reactor, with a specific electrode configuration, and the effect of the semiconductor on plasma formation are examined. Subsequently, the surface and structure of the semiconductor barriers, processed for the three modes, are analyzed at an atomic scale. The results indicate that the plasma produced within the semiconductor barrier discharge (SBD) system exhibits higher homogeneity. Notably, the barrier is active in the Townsend mode. In proportion to the voltage applied to the SBD system, the semiconductor diminishes its barrier property, and the influence of the semiconductor barrier loses upon reaching approximately 1 kV. The plasma becomes inhomogeneous in arc mode, and strong current channels become prominent, leading to substantial degradation of the semiconductor barrier. Furthermore, the proposed electrode configuration presents properties characteristic of a Schottky diode. Ultimately, the electrical equivalent circuit of the reactor demonstrates similarities with a varactor structure. The SBD system's electronic structure and filtering feature could potentially contribute to the future conception of self-controlled BD systems.
dc.identifier.doi10.1007/s11664-023-10716-z
dc.identifier.endpage7817
dc.identifier.issn0361-5235
dc.identifier.issn1543-186X
dc.identifier.issue11
dc.identifier.orcidsolmaz, Ramazan/0000-0001-8933-2922;
dc.identifier.scopus2-s2.0-85171273735
dc.identifier.scopusqualityQ2
dc.identifier.startpage7807
dc.identifier.urihttps://doi.org/10.1007/s11664-023-10716-z
dc.identifier.urihttps://hdl.handle.net/11772/22713
dc.identifier.volume52
dc.identifier.wosWOS:001067546900002
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherSpringer
dc.relation.ispartofJournal of Electronic Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/openAccess
dc.snmzWoS_20251016
dc.subjectSemiconductor Barrier
dc.subjectSbd
dc.subjectHomogeneous Plasma
dc.subjectPlasma
dc.subjectHaadf-Stem
dc.titleExperimental Investigation of Semiconductor Barriers Exposed to Variable Strong Electric Field at Vacuum Conditions
dc.typeArticle
dspace.entity.typePublication

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