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Evolution of surface roughness parameters and microstructure in two-phase nanocrystalline Co-Cu films electrodeposited onto ITO coated glass substrates at different deposition potentials

dc.contributor.authorUmut Sarac,M. Celalettin Baykul
dc.date.accessioned2023-02-10T12:32:45Z
dc.date.available2023-02-10T12:32:45Z
dc.date.issued2014
dc.identifier10.1007/s10854-013-1546-y
dc.identifier.issn1573-482X
dc.identifier.urihttps://dx.doi.org/10.1007/s10854-013-1546-y
dc.identifier.urihttp://hdl.handle.net/11772/10793
dc.sourceJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
dc.subjectElectrical and Electronic Engineering
dc.titleEvolution of surface roughness parameters and microstructure in two-phase nanocrystalline Co-Cu films electrodeposited onto ITO coated glass substrates at different deposition potentials
dc.typeArticle
dc.identifier.volume25
dc.identifier.issue1


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