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Characterization of nanocrystalline Ni-Cu thin films electrodeposited onto ITO coated glass substrates: effect of pretreatment current density

dc.contributor.authorUmut Sarac,M. Celalettin Baykul
dc.date.accessioned2023-02-10T12:32:59Z
dc.date.available2023-02-10T12:32:59Z
dc.date.issued2013
dc.identifier10.1007/s10854-013-1170-x
dc.identifier.issn1573-482X
dc.identifier.urihttps://dx.doi.org/10.1007/s10854-013-1170-x
dc.identifier.urihttp://hdl.handle.net/11772/10832
dc.sourceJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
dc.subjectElectrical and Electronic Engineering
dc.titleCharacterization of nanocrystalline Ni-Cu thin films electrodeposited onto ITO coated glass substrates: effect of pretreatment current density
dc.typeArticle
dc.identifier.volume24
dc.identifier.issue8


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