Comparative studies of morphological and microstructural properties of electrodeposited nanocrsytalline two-phase co-cu thin films prepared at low and high electrolyte temperatures
Özet
In this work, we have studied the effect of the electrolyte temperature on the
compositional, structural, and morphological properties of the Co-Cu thin films grown
onto ITO coated glass substrates by galvanostatic electrodeposition. The galvanostatic
potential-time transients were employed to study the deposition growth process of the
films. The compositional analysis which was made using an energy dispersive X-ray
spectroscopy (EDX) indicated that the Cu composition in the films enhances with
increasing electrolyte temperature. From the X-ray diffraction (XRD) analysis, all of the
Co-Cu films were found to consist of hexagonal close-packed (HCP) Co and face-centered
cubic (FCC) Cu phase structures regardless of electrolyte temperature. The peak intensities
were also changed with electrolyte temperature. It was observed that an enhancement in
the electrolyte temperature gives rise to an increase in the average crystallite size of both
Cu and Co particles. Atomic force microscopy (AFM) analysis revealed that temperature
of the electrolyte significantly affects the surface morphology of the films. Here, several
surface roughness parameters such as root mean square (RMS) roughness, average
roughness, maximum peak height, and maximum valley depth were also presented as a
function of the electrolyte temperature.
